Michael Corbett To Address UPW Micro 2012

Online, October 9, 2012 (Newswire.com) - Michael Corbett, the managing partner in Linx Consulting will be the keynote speaker at the 2012 ULTRAPURE WATER Micro (UPW Micro) to be conducted in Phoenix Tuesday, Nov. 13, and Wednesday, Nov. 14, at the Mesa Hilton Hotel. This year's conference will feature four sessions that will focus on different aspects of semiconductor water treatment concerns.

Mr. Corbett will address the topic of "Semiconductor Industry Trends and Opportunities" as part of Session 1 that will examine "Future Challenges Facing the Semiconductor Industry". In another presentation, Dr. Abbas Rastegar of SEMATECH will examine "Particle Defectivity Challenges for Sub-16 nm HP Technology Node" and Dr. Slava Libman of Balazs Air Liquide will present on developments with the UPW ITRS and SEMI guidelines.

The Tuesday afternoon papers will focus on solutions to meet electronics' industry needs. Wednesday's session topics will be on "UPW Metrology Innovations", and "UPW Technology Optimization and Improvements". In addition to the technical presentations, conference attendees will have the chance to visit tabletop exhibits by leading suppliers in the semiconductor water business. Registration information for the conference and a schedule is available at www.ultrapurewater.com, or by calling 303/973-6700.

Tall Oaks Publishing, the publisher of two on-line technical magazines-ULTRAPURE WATER journal, and INDUSTRIAL WATER TREATMENT, organizes UPW Micro. In addition, the company offers an on-line bookstore with a wide variety of books on industrial and high-purity water treatment subjects, including filtration, reverse osmosis, ion exchange, water used in semiconductor, power generation, and pharmaceutical applications. The bookstore also offers a water treatment encyclopedia on CDs, and well as CDs of past conference proceedings.

Here is the schedule for ULTRAPURE WATER Micro 2012:

ULTRAPURE WATER Micro 2012
Mesa Hilton Hotel (Phoenix)
November 13-13, 2012

PROGRAM:
Session co-moderators: Slava Libman, Ph.D., Balazs Air Liquide; Marty Burkhart, Hi Pure Tech Inc.

Tuesday, November 13
8:45 AM-Introduction

Session 1: Future Challenges Facing the Semiconductor Industry
9:00 AM-Semiconductor Industry Trends and Opportunities
Michael Corbett, managing partner, Linx Consulting
9:45 AM-Particle Defectivity Challenges for Sub-16 nm HP Technology Node
Abbas Rastegar, Ph.D., Lithography- SEMATECH
10:30 AM-Networking Break
11:00 AM- Semiconductor Technology Progress of UPW ITRS and SEMI Cooperation
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.; Slava Libman, Ph.D., Balazs Air Liquide; Dan Wilcox, Spansion; and Marty Burkhart, Hi Pure Tech, Inc.
11:45 AM-1:15 PM-Lunch Break

Session 2: Solutions to Address Electronics Industry UPW Needs
1:15 PM- Organics Speciation in UPW- Challenges and Opportunities
Slava Libman, Ph.D., Balazs Air Liquide; and Stefan Huber, Ph.D., DOC Labor
1:45 PM-Removal of 12-nm particles with a combination of UF and MF
Donald C. Grant and Dennis Chilcote, CT Associates, Inc.; Uwe Beuscher, W.L. Gore and Associates, Inc.
2:15 PM-Total Removal of Nanoparticles in Manufacture of High-Purity Water
Aapo Sääsk, Scarab
2:45 PM-Drastic Reduction of Metallic Impurities in Water Using High-Purity Ion-Exchange Resin
Takeo Fukui, Toshimasa Kato, Takaaki Chuuman, and Nobukazu Arai, Kurita Water Industries Ltd.
3:15 PM-Networking Break in Exhibits Area
3:45 PM- Next Generation Particles Control in Point of Use Application for UPW Supply to Semiconductor Manufacturing
Boris Eliosov, PCB Water Technologies; and Wolfgang Dornfeld, Levitronix, GmbH
4:15 PM-450-mm Polyvinylidene Fluoride Pipe and Fittings Production to Accommodate the Ultrapure Water Volume Demands of Future MegaFabs
Marty Burkhart, Hi Pure Tech, Inc.; Hanspeter Mueller, Georg Fischer Piping Systems; and Casey Williamson, Semtec, Inc.
4:45 PM-Summary Discussion on UPW Challenges and Solutions
5:00 PM-Networking Reception in Exhibits

Wednesday, November 14
Session 3: UPW Metrology Innovations
9:00 AM- 25-Nanometer Optical Particle Counting Technology for High-Purity Water Applications
William L. Shade, Jr., Lighthouse
9:30 AM-Capillary IC- A New Platform for High Throughput or High Resolution Separations of Ionic Compounds
Peter Bodsky and Terri T. Christison , ThermoFisher Scientific- Dionex Products
10:00 AM-Networking Break
10:45AM- New Developments in the Use of Silica and Sodium Measurements in High-Purity Water Quality Specifications for the Electronics Industry
Randy C. Turner, Swan Analytical USA
11:15 AM-UPW System Health Check Up: A Prescription for Optimizing
System Reliability, Quality, and Costs
John Morgan, H2Morgan LLC; Betty Pennington, Balazs NanoAnalysis

11:45-1:15 PM-Lunch in Exhibits Area

Session 4: UPW Technology Optimization and Improvements
1:15 PM- An Updated Look at Minimizing Particle and Metal Ion Contamination on Fluid Control Components
Ed Cellucci, George Evangelos Drazinakis, and Greg Michalchuk, Plast-O-Matic Valves
1:45 PM-Challenges Meeting the UPW Requirements for the Future Fabs
Alan Knapp, Christopher Hall, and Bruce Coulter, Siemens Industry Inc., Water Technologies
2:15 PM-Shifting the Paradigm from Polyvinylchloride and Capital Cost to Polypropylene and Total Cost of Ownership for Semiconductor Applications
John H. Rydzewski, P.E., and Yuen Kong Lai, Intel Corp.
2:45 PM-A Fundamental Shift in Water Disinfection- Research into an Innovative UV LED Design
Jennifer G. Pagan, and Paolo Batonil, Dot Metrics Technologies; and Oliver Lawal and Ken Kershner, Aquionics Inc.
3:15 PM-Overview of Research Projects Underway at Purdue University's Birk Nanotechnology Center
Timothy Miller, Purdue University
3:45 PM-Conference Concludes