RASIRC to Bring Dry Peroxide ™ to SemiconWest/InterSolar 2013

Online, July 7, 2013 (Newswire.com) - RASIRC® will showcase its products and recent technology innovations at the upcoming SemiconWest/ Intersolar North America 2013 conference and exhibition held July 8-11, 2013 in San Francisco. The company will be part of the MATHESON booth (#8711) and available for presentations on their new H2O2 vapor technology. RASIRC products focus on high purity vapor delivery for ALD, oxidation, surface preparation and cleaning.

"RASIRC products address a wide range of applications in both semiconductor and photovoltaic manufacturing," said Jeffrey Spiegelman, RASIRC President and Founder. "We have had a very positive industry response from our new hydrogen peroxide vapor delivery systems. It appears it will change the way future semiconductors are manufactured."

The latest Steamer 225 delivers up to 12.5slm of ultra-high purity steam with better flow control, cost efficiency, safety and reliability than bubblers and torches. Manufactured in RASIRC's ISO 9001:2008 certified facility, the Steamer 225 combines a clean steam generator and purification assembly into a single system proven to increase oxide growth rate, chamber uniformity and film quality. The compact system requires only power, DI water and a drain to operate-no hydrogen safety system, chiller, compressed, or carrier gas. An internal non-porous hydrophilic membrane selectively allows water vapor to pass. Contaminants in water such as dissolved gases, ions, TOCs, urea, particles, viruses, bacteria, pyrons and metals are removed in the steam phase.

The RainMaker Humidification System adds controlled amounts of pure water vapor directly into any carrier gas stream. It can humidify inert, corrosive, and flammable gases, such as hydrogen and oxygen, at a wide range of flow rates. The system can deliver into atmosphere as well as vacuum process pressures.

"The new RASIRC Dry Peroxide technologies have shown to be more effective than water in ALD and other process applications," said Lita Shon-Roy, RASIRC Director of Marketing. "Test results show that for the first time hydrogen peroxide can be used safely and reliably for surface preparation and ALD precursor initiation/oxidation, exceeding the performance of both ozone and water."

For more information about high purity vapor delivery systems or to set an appointment during the event, contact RASIRC directly.