Registration Open for ULTRAPURE WATER Micro Slated for Nov. 13-14

Online, September 16, 2012 (Newswire.com) - Semiconductor water treatment trends will be the focus of ULTRAPURE WATER Micro 2012, which will be conducted Nov. 13-14 at the Hilton Mesa Hotel in the Phoenix area. This year's conference will feature four sessions that will focus on different aspects of semiconductor water treatment concerns.

The meeting will open Tuesday morning, Nov. 13 with Session 1 that will examine Future Challenges Facing the Semiconductor Industry. The conference will begin with a talk on "Semiconductor Industry Trends and Opportunities." Dr. Abbas Rastegar of SEMATECH will follow with a presentation on the topic of "Particle Defectivity Challenges for Sub-16-nm HP Technology Node". Session 1 will conclude with an examination the current state of ITRS and SEMI guidelines impacting semiconductor water treatment.

The Tuesday afternoon session will focus on solutions to meet electronics industry needs. This section will begin with a presentation on organics speciation in semiconductor water by Dr. Slava Libman of Balazs Air Liquide and Dr. Stefan Huber of DOC Labor. That presentation will be followed by technical paper that examines removal of 12-nanometer (nm) particles by ultrafiltration and microfiltration membranes. Other papers that afternoon will also examine particle removal and reduction of metallic impurities. The final presentation for the afternoon will examine 450-mm polyvinylidene fluoride pipe and fittings for megafabs expected to be built in the future.

"UPW Metrology Innovations" will be the topic for Session 3 on Wednesday morning, Nov. 14. Two technical papers will examine particle counting. One will focus on meeting ITRS and SEMI guidelines for semiconductor water, and the second will review a 25-nm particle counting technology. The metrology session will also have a technical presentation on capillary ion chromatography, and a paper on new developments in silica and sodium measurements.

The final conference session will look at technology optimization and improvements for semiconductor water treatment. Topics to be addressed include the shift from polyvinylchloride to polypropolyene, water system disinfection, ion exchange system design, research developments, and challenges for meeting semiconductor water requirements at future fabs.

Conference attendees will have the chance to hear technical presentations by experts in semiconductor water treatment. They also will be able to network with others active in the water business and to visit exhibits by leading suppliers in the semiconductor water business.

ULTRAPURE WATER Micro is organized by Tall Oaks Publishing, which publishes two on-line magazines-ULTRAPURE WATER journal and INDUSTRIAL WATER TREATMENT. The company also has an on-line bookstore that features a variety of water treatment books. Registration information for the conference is available at www.ultrapurewater.com, or by calling 303/973-6700.

Here is the conference schedule:

ULTRAPURE WATER Micro 2012
November 13-14
Hilton Hotel (Mesa)
Phoenix, Arizona

Session co-moderators: Slava Libman, Ph.D., Balazs Air Liquide; Marty Burkhart, Hi Pure Tech Inc.; Rich Riley, Intel

Tuesday, November 13
8:45 AM-Introduction

Session 1: Future Challenges Facing the Semiconductor Industry
9:00 AM-Semiconductor Industry Trends and Opportunities
Michael Corbett, Linx Consulting
9:45 AM-Particle Defectivity Challenges for Sub-16 nm HP Technology Node
Abbas Rastegar, Ph.D., Lithography- SEMATECH
10:30 AM-Networking Break
11:00 AM-Semiconductor Technology Enabling: Progress with UPW ITRS and SEMI Development
Slava Libman, Ph.D., Balazs Air Liquide; Dan Wilcox, Spansion; and Marty Burkhart, Hi Pure Tech, Inc.
11:45 AM-1:15 PM-Lunch Break

Session 2: Solutions to Address Electronics Industry UPW Needs
1:15 PM- Organics Speciation in UPW- Challenges and Opportunities
Slava Libman, Ph.D., Balazs Air Liquide; and Stefan Huber, Ph.D., DOC Labor
1:45 PM-Removal of 12-nm particles with a combination of UF and MF
Donald C. Grant and Dennis Chilcote, CT Associates, Inc.; Uwe Beuscher, W.L. Gore and Associates, Inc.
2:15 PM-Total Removal of Nanoparticles in Manufacture of High-Purity Water
Aapo Sääsk, Scarab
2:45 PM-Drastic Reduction of Metallic Impurities in Water Using High-Purity Ion-Exchange Resin
Takeo Fukui, Toshimasa Kato, Takaaki Chuuman, and Nobukazu Arai, Kurita Water Industries Ltd.
3:15 PM-Networking Break
3:30 PM- Next Generation Particles Control in Point of Use Application for UPW Supply to Semiconductor Manufacturing
Boris Eliosov, PCB Water Technologies; and Wolfgang Dornfeld, Levitronix, GmbH
4:00 PM-450-mm Polyvinylidene Fluoride Pipe and Fittings Production to Accommodate the Ultrapure Water Volume Demands of Future MegaFabs
Marty Burkhart, Hi Pure Tech, Inc.; Hanspeter Mueller, Georg Fischer Piping Systems; and Casey Williamson, Semtec, Inc.
5:00 PM-Networking Reception in Exhibits

Wednesday, November 14
Session 3: UPW Metrology Innovations
9:00 AM- The Development of a New Non-Light Scattering Particle Counter and its Potential Use for Risk Mitigation To Meet ITRS and SEMI Guidelines for Semiconductor UPW
David Blackford, Ph.D., Fluid Measurement Technologies, Inc.
9:30 AM-25-Nanometer Optical Particle Counting Technology for High-Purity Water Applications
William L. Shade, Jr., Lighthouse
10:00 AM-Capillary IC- A New Platform for High Throughput or High Resolution Separations of Ionic Compounds
Peter Bodsky, ThermoFisher Scientific- Dionex Products
10:30 AM-Networking Break
11:00 AM- New Developments in the Use of Silica and Sodium Measurements in High-Purity Water Quality Specifications for the Electronics Industry
Randy C. Turner, Swan Analytical USA

Session 4: UPW Technology Optimization and Improvements
11:30 AM-Shifting the Paradigm from Polyvinylchloride and Capital Cost to Polypropylene and Total Cost of Ownership for Semiconductor Applications
John H. Rydzewski, P.E., and Yuen Kong Lai, Intel Corp.
Noon-1:15 PM-Lunch in Exhibits Area
1:15 AM-A Fundamental Shift in Water Disinfection- Research into an Innovative UV LED Design
Jennifer G. Pagan, and Paolo Batonil, Dot Metrics Technologies; and Oliver Lawal and Ken Kershner, Aquionics Inc.
1:45 PM-Considering the Triboelectric Effect When Designing and Operating Ion-Exchange Mixed Beds in High-Purity Water Systems
John H. Rydzewski, P.E., Intel Corp. (Chandler); Guodong Zhang, Intel Semiconductor (Dalian) Ltd.; and Julian A. Montoya, Intel Corp. (Hillsboro)
2:15 PM-Overview of Research Projects Underway at Purdue University's Birk Nanotechnology Center
Timothy Miller, Purdue University
2:45 PM-An Updated Look at Minimizing Particle and Metal Ion Contamination on Fluid Control Components
Ed Cellucci, George Evangelos Drazinakis, and Greg Michalchuk, Plast-O-Matic Valves
3:15 PM-Challenges Meeting the UPW Requirements for the Future Fabs
Alan Knapp, Christopher Hall, and Bruce Coulter, Siemens Industry Inc., Water Technologies
3:45 PM-Conference Concludes

Visit www.ultrapurewater.com for schedule updates or to register.