Tagged ald
Press Release
Ereztech Announces David Roberts as CTO to Expand Technology and Applications Base of Its Metal-Organic Compounds
Organometallics R&D and Manufacturing Company Seeks Greater Market Penetration in Semiconductor, Nanotechnology, Photovoltaics, Optoelectronics & Specialty Chemicals Read More
Press Release
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD)
RASIRC renewed its funding agreement with the University of California, San Diego (UCSD) for on-going semiconductor processing research. Professor Andrew Kummel of the Department of Chemistry represents UCSD in this agreement. The gift donation supports one student for one year. RASIRC made a similar gift donation last year. RASIRC manufactures BRUTE® hydrogen peroxide and hydrazine vaporizers for emerging ALD applications. Read More
Press Release
RASIRC Water Free Anhydrous Hydrogen Peroxide Demonstrates Five-Fold Increase in Hydroxyl Density
BRUTE™ Peroxide enables dry peroxide gas delivery for ALD Oxide Growth. RASIRC today released research results showing that anhydrous hydrogen peroxide gas enables a five-fold increase in surface hydroxyl density when compared to water in studies involving ALD nucleation on SiGe substrates. Hydroxyl density is an important factor in minimizing interfacial defects, increasing uniformity and improving next generation semiconductor device performance. Read More
Press Release
RASIRC Methods for Safe and Stable Delivery of Hydrogen Peroxide Gas and Hydrazine Gas for ALD
Company presents technical sessions and exhibits at AVS Symposium RASIRC will showcase a family of new technologies at the AVS 62nd International Symposium & Exhibition. Hydrogen peroxide gas with and without water and recent data on hydrazine gas for processing next generation semiconductor materials will be covered in two oral presentations and an exhibit (booth #437). Read More
Press Release
RASIRC Presents Test Results Showing Stable Delivery of Hydrogen Peroxide Gas With or Without Water
RASIRC to present posters and exhibit (Booth #39) at 15th Int'l Conference on Atomic Layer Deposition & ALE Workshop. The companies will showcase hydrogen peroxide gas with or without water. Posters are entitled "In-Situ Monitoring of Hydrogen Peroxide Vapor Delivery Systems for ALD" and "Novel Hydrogen Peroxide Delivery Systems for Atomic Layer Cleaning and Etch". Read More
Press Release
New RASIRC Peroxidizer™ Delivers High Concentration Hydrogen Peroxide Gas into Semiconductor Processes
The Peroxidizer is a high concentration hydrogen peroxide vaporizer designed specifically for the needs of next generation semiconductor processes, including ALD, annealing, cleaning and etching. The Peroxidizer is the first commercial vaporizer capable of delivering concentrations greater than 5% H2O2 gas by volume from 30% H2O2 liquid source. Read More
Press Release
RASIRC Announces Dry Peroxide™ Oxidant at ALD 2013: Company Will Present Poster Session and Exhibit
RASIRC® will begin public discussions on its new Dry Peroxide(TM) vapor delivery system at the upcoming Atomic Layer Deposition (ALD) conference and will present a poster "New Hydrogen Peroxide Vapor Delivery Systems for Surface Preparation and AL Read More
Press Release
RASIRC Presents New Hydrogen Peroxide (H2O2) Vapor Source for Pre-Treatment/Cleaning in Atomic Layer Deposition at Advanced Semiconductor Manufacturing Conf
RASIRC® presented a poster on the topic "New Vaporization Sources for H2O2 for Pre-Treatment and Cleaning of ALD Deposition Surfaces" at the recent Advanced Semiconductor Manufacturing Conference. Read More
Press Release
RASIRC Presents at Sematech Surface Preparation and Cleaning Conference: Describes New Hydrogen Peroxide Vaporization Source
RASIRC presented "New Vaporization Source for H2O2 for Pre-Treatment/Cleaning of ALD Deposition Surfaces" at Sematech Surface Preparation & Cleaning Conf., showing advantages of dry chemistries to address contamination & reduce chemical consumpti Read More
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