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brute-hydrazine
Press Release
Sep 6, 2016
RASIRC Presents on Surface Passivation of New Channel Materials at UCPSS
RASIRC to present "Surface Passivation of New Channel Materials Utilizing Hydrogen Peroxide and Hydrazine Gas" paper at upcoming 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS). Company is also exhibiting.
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Press Release
Aug 31, 2016
RASIRC Renews Funding for Atomic Layer Deposition Research at University of California, San Diego (UCSD)
RASIRC renewed its funding agreement with the University of California, San Diego (UCSD) for on-going semiconductor processing research. Professor Andrew Kummel of the Department of Chemistry represents UCSD in this agreement. The gift donation supports one student for one year. RASIRC made a similar gift donation last year. RASIRC manufactures BRUTEĀ® hydrogen peroxide and hydrazine vaporizers for emerging ALD applications.
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Press Release
Apr 14, 2016
RASIRC to Present Novel Reactive Chemistry Sources at Surface Preparation and Cleaning (SPCC) Conference
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