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Tagged dynamic-vapor

Press Release Jul 9, 2015

Hydrogen Peroxide Gas for Next Generation Semiconductor Processes

RASIRC BRUTE™ Peroxide delivers water-free H2O2 to enable new ALD reactions. BRUTE Peroxide is the only commercially available technology that can deliver up to 99.9% H2O2 gas by volume. In comparison, traditional H2O2 vaporizers typically deliver less than 1% H2O2 gas by volume from standard H2O2 liquid source. High concentration H2O2 gas improves wafer coverage density over water by as much as three times, leading to better initial growth rates and fewer defects. Read More

Press Release Oct 22, 2014

RASIRC Technology Successfully Used to Clean and Prepare Germanium Surfaces

RASIRC announced independent test results that show high purity hydrogen peroxide vapor delivered to process by RASIRC technology enables removal of carbon-based contaminants from Germanium surfaces. Read More

RASIRC Enables Liquid Hydrogen Peroxide to be used in Vapor Phase Cleaning

Press Release Sep 15, 2014

RASIRC Enables Liquid Hydrogen Peroxide to be used in Vapor Phase Cleaning

RASIRC®, the leader in delivery of dynamic vapors, announced that the company will discuss delivery of ultra high purity hydrogen peroxide vapor at the upcoming 12th International UCPSS Symposium, September 21-24, 2014 in Brussels, Belgium. Read More

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