RASIRC BRUTE™ Peroxide delivers water-free H2O2 to enable new ALD reactions. BRUTE Peroxide is the only commercially available technology that can deliver up to 99.9% H2O2 gas by volume. In comparison, traditional H2O2 vaporizers typically deliver less than 1% H2O2 gas by volume from standard H2O2 liquid source. High concentration H2O2 gas improves wafer coverage density over water by as much as three times, leading to better initial growth rates and fewer defects.
Read MoreRASIRC to present posters and exhibit (Booth #39) at 15th Int'l Conference on Atomic Layer Deposition & ALE Workshop. The companies will showcase hydrogen peroxide gas with or without water. Posters are entitled "In-Situ Monitoring of Hydrogen Peroxide Vapor Delivery Systems for ALD" and "Novel Hydrogen Peroxide Delivery Systems for Atomic Layer Cleaning and Etch".
Read MoreThe Peroxidizer is a high concentration hydrogen peroxide vaporizer designed specifically for the needs of next generation semiconductor processes, including ALD, annealing, cleaning and etching. The Peroxidizer is the first commercial vaporizer capable of delivering concentrations greater than 5% H2O2 gas by volume from 30% H2O2 liquid source.
Read More"Unbounded" represents the culmination of an artistic exchange begun in April 2012 between Manhattan Graphics Center, a 30 year old studio and school devoted to the fine art of print-making, and Hollar Gallery, a contemporary printmaking studio f
Read MoreChristian Heckscher created and produced two custom-etched antique bronze murals above the entrance of the new Andaz 5th Avenue Hotel in Midtown Manhattan. The hotel, designed by the legendary Tony Chi opened on July 5th 2010.
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