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h2o2-gas
Press Release
Apr 14, 2016
RASIRC to Present Novel Reactive Chemistry Sources at Surface Preparation and Cleaning (SPCC) Conference
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Press Release
Oct 14, 2015
RASIRC Methods for Safe and Stable Delivery of Hydrogen Peroxide Gas and Hydrazine Gas for ALD
Company presents technical sessions and exhibits at AVS Symposium RASIRC will showcase a family of new technologies at the AVS 62nd International Symposium & Exhibition. Hydrogen peroxide gas with and without water and recent data on hydrazine gas for processing next generation semiconductor materials will be covered in two oral presentations and an exhibit (booth #437).
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Press Release
Jul 9, 2015
Hydrogen Peroxide Gas for Next Generation Semiconductor Processes
RASIRC BRUTE™ Peroxide delivers water-free H2O2 to enable new ALD reactions. BRUTE Peroxide is the only commercially available technology that can deliver up to 99.9% H2O2 gas by volume. In comparison, traditional H2O2 vaporizers typically deliver less than 1% H2O2 gas by volume from standard H2O2 liquid source. High concentration H2O2 gas improves wafer coverage density over water by as much as three times, leading to better initial growth rates and fewer defects.
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