Innovative new products that purify and deliver ultra-pure oxidation chemistries

RASIRC to present "Surface Passivation of New Channel Materials Utilizing Hydrogen Peroxide and Hydrazine Gas" paper at upcoming 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS). Company is also exhibiting.

RASIRC renewed its funding agreement with the University of California, San Diego (UCSD) for on-going semiconductor processing research. Professor Andrew Kummel of the Department of Chemistry represents UCSD in this agreement. The gift donation supports one student for one year. RASIRC made a similar gift donation last year. RASIRC manufactures BRUTE® hydrogen peroxide and hydrazine vaporizers for emerging ALD applications.