This is a distinct advantage over costly traditional methods such as chemicals or abrasive blasting systems that have a negative environmental impact, hazardous fumes, or can damage the substrate.

The Peroxidizer is a high concentration hydrogen peroxide vaporizer designed specifically for the needs of next generation semiconductor processes, including ALD, annealing, cleaning and etching. The Peroxidizer is the first commercial vaporizer capable of delivering concentrations greater than 5% H2O2 gas by volume from 30% H2O2 liquid source.

RASIRC announced independent test results that show high purity hydrogen peroxide vapor delivered to process by RASIRC technology enables removal of carbon-based contaminants from Germanium surfaces.

RASIRC®, the leader in delivery of dynamic vapors, announced that the company will discuss delivery of ultra high purity hydrogen peroxide vapor at the upcoming 12th International UCPSS Symposium, September 21-24, 2014 in Brussels, Belgium.

Creodyne announced today the release of an improved Surfinator Pro™ UV/Ozone surface cleaning and conditioning system. A new program to streamline Surfinator Pro™ production was launched in parallel with the upgraded system.

RASIRC® will showcase its products and innovations at the SemiconWest/ Intersolar North America 2013 conference and exhibition. The company will be in the MATHESON booth (#8711) and available for presentations on their new H2O2 vapor technology.