This is a distinct advantage over costly traditional methods such as chemicals or abrasive blasting systems that have a negative environmental impact, hazardous fumes, or can damage the substrate.
Read MoreRASIRC® will begin public discussions on its new Dry Peroxide(TM) vapor delivery system at the upcoming Atomic Layer Deposition (ALD) conference and will present a poster "New Hydrogen Peroxide Vapor Delivery Systems for Surface Preparation and AL
Read MoreRASIRC® will showcase its products and innovations at the SemiconWest/ Intersolar North America 2013 conference and exhibition. The company will be in the MATHESON booth (#8711) and available for presentations on their new H2O2 vapor technology.
Read MoreRASIRC presented "New Vaporization Source for H2O2 for Pre-Treatment/Cleaning of ALD Deposition Surfaces" at Sematech Surface Preparation & Cleaning Conf., showing advantages of dry chemistries to address contamination & reduce chemical consumpti
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